Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure

It has been reported that the good correlation in sensitivity and resolution between EUV exposure EB because of similar mechanism photochemical-reaction photoresists during exposure. However, early stages resist development, there are problems on points cost time-consuming to evaluate all materials by Therefore, we investigated possibility using KrF as initial screening resists. If exposure, can be found, it will possible a step-by-step manner, such with first, followed finally evaluation stage. In this paper, report our investigations case novolac resists, PHS chemically amplified acrylic polymer